Metal Oxide TFT PVD

Areesys currently provides PVD equipment for depositing amorphous metal oxide TFT layer on Gen 2 to Gen 5 glass substrates. Our patent-pending PVD deposition source offers the following advantages:

• Lowest plasma damage to sensitive device
• Better uniformity of composition and thickness for amorphous metal oxide
• Scalable to future equipment generations

For more information, please contact us.